UltraFast Innovations (UFI)

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UltraFast Innovations (UFI) 45° AOI Ultrafast Chirped Mirrors UltraFast Innovations (UFI) 45° AOI Ultrafast Chirped Mirrors
  • High Reflectivity and Negative Group Delay Dispersion (GDD)
  • Ideal for Dispersion Compensation and Beam Compression @ 45° AOI
  • Designs for Femtosecond Lasers, Including Ti:sapphire
UltraFast Innovations (UFI) Ultra-Broadband Complementary Chirped Mirror Pairs UltraFast Innovations (UFI) Ultra-Broadband Complementary Chirped Mirror Pairs
  • Ideal for Chirped-Pulse Amplifier Systems and Ultra-Broadband Laser Oscillators
  • Ultra-Broadband Design Supports Dispersion Compensation
  • Negative GDD as Low as -60fs2 and High Reflectivity (>99%) at 600 – 950nm or 650 – 1350nm
UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors
  • Reflection >99.8% (P-polarization) at 720 – 840nm or 780 – 830nm
  • Low Group Delay Dispersion at 5° or 20° AOIs 
  • Ideal for Pulse Compression of Ti:sapphire Ultrafast Lasers
  • Low GDD Mirrors Also Available
UltraFast Innovations (UFI) 1030nm Highly-Dispersive Ultrafast Mirrors UltraFast Innovations (UFI) 1030nm Highly-Dispersive Ultrafast Mirrors
  • Highly Negative GDD up to -1000 fs2 at 7° AOI
  • >99.8% Minimum Reflection across 60nm Bandwidth
  • Ideal for Dispersion Compensation of Yb:doped Fiber Lasers
  • Ultrafast Chirped Coating
UltraFast Innovations (UFI) 1030nm Highly-Dispersive Broadband Ultrafast Mirrors UltraFast Innovations (UFI) 1030nm Highly-Dispersive Broadband Ultrafast Mirrors
  • Negative GDD of -200 fs2 at 5° AOI
  • >99.8% Reflection (p-polarization) between 950 - 1120nm
  • Designed for Pulse Compression of Yb:doped Fiber Lasers
  • Broadband Ultrafast Chirped Coating
UltraFast Innovations (UFI) 2μm Highly-Dispersive Broadband Ultrafast Mirrors UltraFast Innovations (UFI) 2μm Highly-Dispersive Broadband Ultrafast Mirrors
  • Reflectivity >99.9% Between 2000 - 2200nm
  • GDD of -1000fs2 @ 5° AOI
  • Ideal for <100fs Pulse Compression of Thulium and Holmium Lasers
  • Broadband Ultrafast Chirped Coating

UltraFast Innovations (UFI) High-Power Low-Loss Laser Mirrors UltraFast Innovations (UFI) High-Power Low-Loss Laser Mirrors
  • >99.99% Reflectivity at 1030nm and 1064nm
  • Laser Damage Threshold of 50 J/cm2 at 1064nm, 100Hz, 8ns
  • Universal Designs for Nanosecond, Picosecond, and Femtosecond Laser Pulses
  • Custom Options are Available up to 200mm Diameter
UltraFast Innovations (UFI) Positive Dispersion Ultrafast Mirrors UltraFast Innovations (UFI) Positive Dispersion Ultrafast Mirrors
UltraFast Innovations (UFI) 255-277nm Negative Dispersion UV Ultrafast Mirrors UltraFast Innovations (UFI) 255-277nm Negative Dispersion UV Ultrafast Mirrors
  • Negative GDD of -145 fs2
  • Angle of Incidence of 5° between 255 - 277nm
  • Ideal for Pulse Compression or Dispersion Compensation of UV Ultrafast Laser Beams
  • Unique UV Negative Dispersion Ultrafast Coating
UltraFast Innovations (UFI) 1030nm Highly-Dispersive Ultrafast Mirrors with Reduced Thermal Lensing UltraFast Innovations (UFI) 1030nm Highly-Dispersive Ultrafast Mirrors with Reduced Thermal Lensing
  • Ultrafast Highly-Dispersive Coating with Reduced Thermal Lensing
  • Highly Negative GDD up to -1000 fs2 at 5° AOI
  • >99.5% Minimum Reflection (P-Polarization) across 50nm Bandwidth
  • Ideal for the Generation of High-Power Ultrafast Laser Pulses
UltraFast Innovations (UFI) 3200nm Highly-Positive Dispersive Ultrafast Mirrors UltraFast Innovations (UFI) 3200nm Highly-Positive Dispersive Ultrafast Mirrors
  • Positive GDD of 500 fs2 at 5° AOI
  • >99.9% Minimum Reflection (P-Polarization)
  • Broadband Mid-IR Coating Design Covers 2800 – 3600nm
  • Ideal for Mid-IR Mode-Locked Lasers
UltraFast Innovations (UFI) Third Order Dispersion (TOD) Ultrafast Mirrors UltraFast Innovations (UFI) Third Order Dispersion (TOD) Ultrafast Mirrors
UltraFast Innovations (UFI) EUV/XUV Attosecond Multilayer Mirrors UltraFast Innovations (UFI) EUV/XUV Attosecond Multilayer Mirrors
  • Designed for 330 Attosecond Pulses @ 65eV (19nm)
  • Multilayer Coating with 38% Peak Reflectivity
  • ≤1Å (Angstrom) Surface Roughness Superpolished Substrates
  • EUV Flat Mirrors and EUV Spherical Mirrors Designed at 13.5nm Also Available
  • Available from Stock
  • No Minimum Order Quantities, No Coating Lot Charges
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